In-Situ 4000 Process Monitor Application Checklist
Please respond to the following questions as completely as possible to ensure process compatibility.
Your contact information: * Indicates required field
1) General process type: (e.g. MBE, MOCVD, VPE, etc.)
2) Deposition chamber manufacturer & model number (Observation Geometry), view-port diameter, and material:
3) Substrate material: (e.g. Silicon, GaAs, etc.)
4) Substrate size and thickness:
5) Film material structure:
6) Deposition rates:
7) Substrate temperature range of interest:
8) How is the substrate heated? (e.g. conductive, radiative, etc.)
9) Which of the following are required monitor parameters: Substrate temperature Yes No Film thickness Yes No Film index of refraction Yes No
10) Does the substrate move during deposition? Yes No
11) Is there clearance for the optical head (125x125x150 mm) near the viewport? Yes No
12) Are there other sources of light or heat in the vacuum chamber? (e.g. filaments, effusion cells)
Please add any comments, sketches, or notes: