Electron Beam Evaporation

The SVTA-EBS COMPACT E-BEAM is a very versatile component for depositing thin layers of Carbon, Silicon, and Refractory Metals. It provides researchers a simple and economical means of depositing high purity thin films. The source utilizes an electron beam power supply for electron emission and an integral flux monitor (SVTA-EBS-5). Whether the source is being evaporated in solid rod or powder form the resulting layers are ultra-pure. The material composition of the electron beam evaporation source is compatible with the intended growth material.

SVTA also offers a complete turn-key electron evaporation system for depositing IV-IV materials and metals.

Applications:

• Metallization
• Magnetic Thin Films
• Silicon MBE
• Interface Studies
• Doping

Technical Documentation:

• SVT-EBS COMPACT Evaporation Source

Contact SVTA for more information.